Title

Nanostructures using self-assembled multilayers as molecular rulers and etch resists

ACS Citation

Srinivasan, C.; Hohman, J.N.; Anderson, M.E.; Weiss, P.S.; Horn, M.W. Nanostructures Using Self-Assembled Multilayers as Molecular Rulers and Etch Resists. J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. -- Process., Meas., Phenom.2007,26, 1985-1988.

Abstract

Self-assembled multilayers, composed of alternating layers of α,ω-mercaptoalkanoic acids and Cu2+ ions (“molecular rulers”), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.

Source Name

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

Publication Date

12-6-2007

Volume

25

Issue

6

Page(s)

1985-1988

Document Type

Citation

Citation Type

Article

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