Title

Combining Conventional Lithography with Molecular Self‐Assembly for Chemical Patterning

ACS Citation

Anderson, M.E.; Srinivasan, C.; Hohman, J.N.; Carter, E.M.; Horn, M.W.; Weiss, P.S. Combining Conventional Lithography with Molecular Self-Assembly for Chemical Patterning. Advanced Materials.2006,18, 3258-3260.

Abstract

An innovative method to obtain chemical patterns with tailored functionality and directed alignment is described (see figure). The patterns are generated by employing lithographic processing, which is compatible with molecular self‐assembly and capable of withstanding photo‐oxidation. The robust lithographic resist protects against cross‐ contamination, permitting several self‐assembled monolayers terminated with different functional groups to be patterned.

Source Name

Advanced Materials

Publication Date

12-11-2006

Volume

18

Issue

24

Page(s)

3258-3260

Document Type

Citation

Citation Type

Article

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