Title

Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise, Controllable Nanometer‐Scale Spacings Created by Molecular Rulers

ACS Citation

Anderson, M.E.; Tan, L.P.; Mihok, M.; Tanaka, H.; Horn, M.W.; McCarty, G.S.; Weiss, P.S. Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise Controllable Nanometer-Scale Spacings Created by Molecular Rulers. Advanced Materials.2006,18, 1020-1022.

Abstract

A hybrid approach to nanolithography combines conventional lithography with chemical self‐assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self‐assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication.

Source Name

Advanced Materials

Publication Date

4-7-2006

Volume

8

Issue

8

Page(s)

1020-1022

Document Type

Citation

Citation Type

Article

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