Title

Exploiting intermolecular interactions and self-assembly for ultrahigh resolution nanolithography

ACS Citation

Anderson, M.E.; Smith, R.K.; Donhauser, Z.J.; Hatzor, A.; Lewis, P.A.; Tan, L.P.; Tanaka, H.; Horn, M.W.; Weiss, P.S. Exploiting Intermolecular Interactions and Self-Assembly for Ultrahigh Resolution Nanolithography. J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. -- Process., Meas., Phenom.2002,20, 2739-2744.

Abstract

The combination of self-, directed, and positional assembly techniques, i.e., “bottom up” fabrication, will be essential for patterning and connecting future nanodevices. Systematic exploration of local intermolecular interactions on surfaces will permit their exploitation for the rational design of molecular-scale surface structures. We use the scanning tunneling microscope to probe the local behavior of self-assembled films at the nanometer scale. The ability to control the molecular placement within and by self-assembled monolayers is a means of patterning surfaces. A monolayer with customized features can be produced by manipulating the dynamics of film formation, which are heavily affected by the selectable intermolecular interactions of adsorbates and the structural components naturally occurring within the films. Additionally, the controlled placement and thickness of self-assembled multilayers created from alternating strata of α,ω-mercaptoalkanoic acids and coordinated metal ions can be developed to form precise “molecular ruler” resists and to assist in the formation of tailored, lithographically defined metal contacts.

Source Name

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

Publication Date

12-9-2002

Volume

20

Issue

6

Page(s)

2739-2744

Document Type

Citation

Citation Type

Article

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