Nanostructures using self-assembled multilayers as molecular rulers and etch resists
ACS Citation
Srinivasan, C.; Hohman, J.N.; Anderson, M.E.; Weiss, P.S.; Horn, M.W. Nanostructures Using Self-Assembled Multilayers as Molecular Rulers and Etch Resists. J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. -- Process., Meas., Phenom.2007,26, 1985-1988.
Version of Record
Abstract
Self-assembled multilayers, composed of alternating layers of α,ω-mercaptoalkanoic acids and Cu2+ ions (“molecular rulers”), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.
Source Name
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Publication Date
12-6-2007
Volume
25
Issue
6
Page(s)
1985-1988
Document Type
Citation
Citation Type
Article