Sub-30-nm patterning on quartz for imprint lithography templates
ACS Citation
Srinivasan, C.; Hohman, J.N.; Anderson, M.E.; Weiss, P.S.; Horn, M.W. Sub-30-Nanometer Patterning on Quartz for Nanolithography Imprint Templates. Appl. Phys. Lett.2008,93, 083123.
Version of Record
Abstract
A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub-30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.
Source Name
Applied Physics Letters
Publication Date
8-29-2008
Volume
93
Issue
8
Page(s)
083123
Document Type
Citation
Citation Type
Article
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