Sub-30-nm patterning on quartz for imprint lithography templates
Srinivasan, C.; Hohman, J.N.; Anderson, M.E.; Weiss, P.S.; Horn, M.W. Sub-30-Nanometer Patterning on Quartz for Nanolithography Imprint Templates. Appl. Phys. Lett.2008,93, 083123.
A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub-30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.
Applied Physics Letters