Combining Conventional Lithography with Molecular Self‐Assembly for Chemical Patterning
ACS Citation
Anderson, M.E.; Srinivasan, C.; Hohman, J.N.; Carter, E.M.; Horn, M.W.; Weiss, P.S. Combining Conventional Lithography with Molecular Self-Assembly for Chemical Patterning. Advanced Materials.2006,18, 3258-3260.
Version of Record
Abstract
An innovative method to obtain chemical patterns with tailored functionality and directed alignment is described (see figure). The patterns are generated by employing lithographic processing, which is compatible with molecular self‐assembly and capable of withstanding photo‐oxidation. The robust lithographic resist protects against cross‐ contamination, permitting several self‐assembled monolayers terminated with different functional groups to be patterned.
Source Name
Advanced Materials
Publication Date
12-11-2006
Volume
18
Issue
24
Page(s)
3258-3260
Document Type
Citation
Citation Type
Article
COinS