Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise, Controllable Nanometer‐Scale Spacings Created by Molecular Rulers
ACS Citation
Anderson, M.E.; Tan, L.P.; Mihok, M.; Tanaka, H.; Horn, M.W.; McCarty, G.S.; Weiss, P.S. Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise Controllable Nanometer-Scale Spacings Created by Molecular Rulers. Advanced Materials.2006,18, 1020-1022.
Version of Record
Abstract
A hybrid approach to nanolithography combines conventional lithography with chemical self‐assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self‐assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication.
Source Name
Advanced Materials
Publication Date
4-7-2006
Volume
8
Issue
8
Page(s)
1020-1022
Document Type
Citation
Citation Type
Article
COinS